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    2. Image reversal negative working o-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment and element produced therefrom

      ...re developed in AZ 440 MIF Developer availablefrom the AZ Photoresists Group of Hoechst Celanese Corporation, Somerville, N.J. (a 0.40N solution of tetramethylammonium hydroxide) in an immersion mode process for 4 minute...
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